Influence of ion-neutral collision parameters on dynamic structure of magnetized sheath during plasma immersion ion implantation
Authors
Abstract
AbstractA cold magnetized plasma sheath is considered to examine the gas pressure effect on the sheath dynamics. A fluid model is used to describe the plasma sheath dynamic. The governing fluid equations in the plasma are solved from plasma center to the target using the finite difference method and some convenient initial and boundary conditions at the plasma center and target. It is found that, the ion-neutral collision has significant effect on the dynamic characteristics of the high-voltage sheath in the plasma immersion ion implantation (PIII). It means that, the temporal profile of the ion dose on the target and sheath width are decreased by increasing the gas pressure. Also, the gas pressure substantially diminishes the temporal psychograph of ion incident angle on the target.
