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JTAP-01.10.2023

Journal of Theoretical and Applied Physics (JTAP)

Editor-in-Chief: Davoud Dorranian, PhD

Online ISSN: 2251-7235

Print ISSN: 2251-7227

Publishes Bimonthly

Temperature dependence of resistivity of RFeAsO compounds

AbstractThe resistivity (ρ) data for RFeAsO compounds (R = Ce, Pr, Nd, Sm), in the temperature (T) range 35–315 K have been analyzed to identify the dominant scattering mechanisms. Close to the room temperature, the system appears to be a metal with low electron density, and the electron–phonon scattering is the dominant one. At lower temperatures, electron–electron scattering […]

The effect of varying temperature and O2 flow rate in ex situ annealed tin-doped indium for fabrication of commercial grade indium tin oxide

AbstractIn this work, tin-doped indium was deposited on a glass substrate via the electron beam evaporation technique. Then, the as-grown thin films were baked in the presence of oxygen at different O2 flow rates and temperatures inside a furnace to obtain transparent conducting oxide thin film structures. The electrical and optical properties of the layers […]

Influence of argon gas flow on mechanical and electrical properties of sputtered titanium nitride thin films

AbstractTitanium nitrides have good mechanical, tribological, electrical, biomedical, and optical properties; therefore, they are used to harden and protect cutting and sliding surfaces, as semiconductor devices, and as a nontoxic exterior for biomedical applications. The dependence of the mechanical and electrical properties of titanium nitride thin films deposited on silicon substrates by direct-current reactive magnetron […]