The present report describes the deposition of SiC-NiCr films on Zr substrates under an H2 gas environment by plasma focusing (PF). Using the spark plasma sintering (SPS) method, the anode for the plasma focus device was made from SiC, Ni, and Chromium powders. X-ray diffraction (XRD) of SiC-NiCr samples shows a change in the position and […]
AbstractIn this experimental study, a 1.5-kJ plasma focus device of Mather type was employed to grow titanium aluminum nitride (TiAlN) coatings at room temperature on 316 stainless steel sub-layer. The anode of the device was made of Titanium and Aluminium. A mixture of N2 and Ar gases was used as the work gas for TiAlN […]
AbstractThe length of insulator sleeve is varied to investigate its effect on the pinch formation in the plasma focus facility. In this paper, the effect of insulator length on the time to pinch at various pressures and working voltages in the 1.15 kJ Mather type plasma focus is investigated. The results show that with 4.5 cm insulator […]
In this study, a 2 kJ plasma focus device of Mather type was employed to grow Copper Oxide (CuO) thin film at room temperature on the glass substrate. The anode of the device was made of Copper alloys. A mixture of oxygen and argon (O2+ Ar) gases was used as the working gas for CuO […]
