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JTAP-01.10.2023

Journal of Theoretical and Applied Physics (JTAP)

Editor-in-Chief: Davoud Dorranian, PhD

Online ISSN: 2251-7235

Print ISSN: 2251-7227

Publishes Bimonthly

Chromium thin film deposition on ITO substrate by RF sputtering

AbstractTo obtain a suitable ohmic contact with the lowest resistivity, chromium (Cr) thin films were deposited on transparent conductive oxide indium tin oxide (ITO) by RF sputtering method in argon atmosphere and its electrical properties were optimized. The deposition of Cr thin film has been performed for the layers with thickness of 150, 300 and […]