In this paper, the optical images of glow discharge plasma and the finite element method simulation of the magnetic field strength in a balanced and two types of unbalanced DC circular planar magnetron sputtering sources are presented. The investigation showed that wherever the magnetic field strength is stronger, the intensity of light and the ionization […]
AbstractIn this study, the effect of oxygen content on a thin copper oxide layer deposited on BK7 and steel substrates by DC magnetron sputtering were investigated. Argon as working gas with impurity of 99.9% and various oxygen ratios were used to sputter a pure Cu cathode target in a cylindrical geometry. The produced samples were […]
AbstractCadmium telluride (CdTe) is a p-type II-VI compound semiconductor, which is an active component for producing photovoltaic solar cells in the form of thin films, due to its desirable physical properties. In this study, CdTe film was deposited using the radio frequency (RF) magnetron sputtering system onto a glass substrate. To improve the properties of […]
AbstractPhysical properties of transparent and conducting indium tin oxide (ITO) thin films grown by radiofrequency (RF) magnetron sputtering are studied systematically by changing deposition time. The X-ray diffraction (XRD) data indicate polycrystalline thin films with grain orientations predominantly along the (2 2 2) and (4 0 0) directions. From atomic force microscopy (AFM) it is found that by increasing […]
bstractSwanepoel method is employed for spectroscopic determination of optical properties of Cu3N thin film using transmittance data. Investigated films have been deposited using reactive magnetron sputtering system. Deposition time was 9 to 21 min. Refractive index, absorption coefficient, and bandgap energy of the samples are determined. Thickness of the films is calculated by Swanepoel method, and […]
