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JTAP-01.10.2023

Journal of Theoretical and Applied Physics (JTAP)

Editor-in-Chief: Davoud Dorranian, PhD

Online ISSN: 2251-7235

Print ISSN: 2251-7227

Publishes Bimonthly

Properties of nanoscale copper oxide thin film deposited by plasma focus device

In this study, a 2 kJ plasma focus device of Mather type was employed to grow Copper Oxide (CuO) thin film at room temperature on the glass substrate. The anode of the device was made of Copper alloys. A mixture of oxygen and argon (O2+ Ar) gases was used as the working gas for CuO […]

Properties of nanoscale copper oxide thin film deposited by plasma focus device