AbstractCopper thin films of 80-nm thickness were deposited on glass substrate using electron beam deposition at two different deposition angles of 0° and 40°, and they were post-annealed under flow of nitrogen at different temperatures. The structure of the films was analyzed using X-ray diffraction, atomic force microscope, and scanning electron microscope. Investigation on the […]
AbstractZirconium thin films were deposited on a glass substrate using direct current magnetron sputtering technique and then post-annealed at different temperatures (100°C to 500°C in steps of 100°C) in an oxygen constant flow. The dependence of crystallographic structure, surface morphology, chemical composition, and electrical and decorative properties of the films on the annealing temperature was […]
