AbstractIn this study, the effect of oxygen content on a thin copper oxide layer deposited on BK7 and steel substrates by DC magnetron sputtering were investigated. Argon as working gas with impurity of 99.9% and various oxygen ratios were used to sputter a pure Cu cathode target in a cylindrical geometry. The produced samples were […]
AbstractIn this work, the copper films were deposited on quartz substrates by DC magnetron sputtering method and then, the prepared films were annealed in air atmosphere at different annealing temperatures. Before annealing, some of the copper films, treated by oxygen plasma, for comparison of the results. The structural and morphological properties of the films have […]
AbstractThis paper is an attempt to compare the influence of various annealing conditions on growth, nanostructure, surface morphology and electrical properties of copper oxide thin films. Cu thin films of 85 nm thickness were deposited on glass substrate by thermal evaporation method, and then post-annealed at different environments (air and oxygen flow), different temperatures (200–400 °C) and […]
