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JTAP-01.10.2023

Journal of Theoretical and Applied Physics (JTAP)

Editor-in-Chief: Davoud Dorranian, PhD

Online ISSN: 2251-7235

Print ISSN: 2251-7227

Publishes Bimonthly

Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation

AbstractNanocrystalline nickel oxide (NiO) thin films were successfully grown on quartz substrates by two-step method. In the first step, nickel films were deposited on quartz substrates by DC magnetron sputtering technique. Then, the plasma oxidation of nickel films was used for preparation of nickel oxide. The effect of DC plasma power and treatment time on […]

Original Article
Effect of silver thickness on structural, optical and morphological properties of nanocrystalline Ag/NiO thin films

AbstractSilver (Ag) nanolayers were deposited on nickel oxide (NiO) thin films by DC magnetron sputtering. The thickness of Ag layers was in range of 20–80 nm by variation of deposition time between 10 and 40 s. X-ray diffraction results showed that the crystalline properties of the Ag/NiO films improved by increasing the Ag film thickness. Also, atomic […]