AbstractZirconium oxide thin films were grown successfully by thermal annealing of zirconium thin films deposited on quartz and silicon substrates by direct current magnetron sputtering technique. The structural and optical properties in relation to thermal annealing times were investigated. The X-ray diffraction patterns revealed that structure of films changes from amorphous to crystalline by increase […]
AbstractZirconium thin films were deposited on a glass substrate using direct current magnetron sputtering technique and then post-annealed at different temperatures (100°C to 500°C in steps of 100°C) in an oxygen constant flow. The dependence of crystallographic structure, surface morphology, chemical composition, and electrical and decorative properties of the films on the annealing temperature was […]
