The present report describes the deposition of SiC-NiCr films on Zr substrates under an H2 gas environment by plasma focusing (PF). Using the spark plasma sintering (SPS) method, the anode for the plasma focus device was made from SiC, Ni, and Chromium powders. X-ray diffraction (XRD) of SiC-NiCr samples shows a change in the position and […]
