AbstractTitanium nitrides have good mechanical, tribological, electrical, biomedical, and optical properties; therefore, they are used to harden and protect cutting and sliding surfaces, as semiconductor devices, and as a nontoxic exterior for biomedical applications. The dependence of the mechanical and electrical properties of titanium nitride thin films deposited on silicon substrates by direct-current reactive magnetron […]
AbstractA 2.2-kJ Mather type plasma focus device charged at 18 kV was used to deposit titanium nitride on 304 type stainless steel substrates. The plasma focus device is fitted with solid titanium anode and operated with nitrogen as the filling gas. The process of deposition was done at room temperature, and samples were deposited at […]
