AbstractThe study focused on the production of zinc oxide (ZnO) thin films as a dielectric material for use in metal–insulator–semiconductor capacitors. The objective of this study has demonstrated the frequency dependence of conductivity and capacity. Zinc oxide (ZnO) was thin films deposited by a silicon wavelength sputteringmagnetron cathode sputtering. The capacitive properties of ZnO zinc […]
AbstractA simple spray pyrolysis technique has been used to fabricate ZnO/Mn thin films with different Mn concentrations (0, 5, 10 and 15 mol.%) for gas sensing applications. X-ray diffraction (with Cu-Kα radiation) patterns of the samples revealed the formation of single-phase wurtzite structure. The samples were characterized using field-emission scanning electron microscopy and scanning tunneling microscopy. […]
AbstractSilver (Ag) nanolayers were deposited on nickel oxide (NiO) thin films by DC magnetron sputtering. The thickness of Ag layers was in range of 20–80 nm by variation of deposition time between 10 and 40 s. X-ray diffraction results showed that the crystalline properties of the Ag/NiO films improved by increasing the Ag film thickness. Also, atomic […]
AbstractIn this study, the effect of oxygen content on a thin copper oxide layer deposited on BK7 and steel substrates by DC magnetron sputtering were investigated. Argon as working gas with impurity of 99.9% and various oxygen ratios were used to sputter a pure Cu cathode target in a cylindrical geometry. The produced samples were […]
AbstractTitanium nitrides have good mechanical, tribological, electrical, biomedical, and optical properties; therefore, they are used to harden and protect cutting and sliding surfaces, as semiconductor devices, and as a nontoxic exterior for biomedical applications. The dependence of the mechanical and electrical properties of titanium nitride thin films deposited on silicon substrates by direct-current reactive magnetron […]
AbstractZirconium thin films were deposited on a glass substrate using direct current magnetron sputtering technique and then post-annealed at different temperatures (100°C to 500°C in steps of 100°C) in an oxygen constant flow. The dependence of crystallographic structure, surface morphology, chemical composition, and electrical and decorative properties of the films on the annealing temperature was […]
bstractSwanepoel method is employed for spectroscopic determination of optical properties of Cu3N thin film using transmittance data. Investigated films have been deposited using reactive magnetron sputtering system. Deposition time was 9 to 21 min. Refractive index, absorption coefficient, and bandgap energy of the samples are determined. Thickness of the films is calculated by Swanepoel method, and […]
AbstractSilver selenide (Ag2Se) thin films of thickness between 80 and 160 nm were prepared by thermal evaporation method. From XRD studies, the structure of the prepared film is confirmed to exhibit orthorhombic structure with polycrystalline nature. The average grain size of Ag2Se has been determined as 43 nm. EDAX spectra of these films were taken, and its […]
