AbstractNanocrystalline α-MoO3 thin films were prepared successfully by thermal annealing of molybdenum (Mo) thin films deposited on quartz and silicon substrates using DC magnetron sputtering method. The influence of annealing temperatures ranging from 400 to 1,000 °C on the structural, morphological and optical properties of the prepared films was investigated by X-ray diffraction, Fourier transform infrared […]
