AbstractCopper thin films of 80-nm thickness were deposited on glass substrate using electron beam deposition at two different deposition angles of 0° and 40°, and they were post-annealed under flow of nitrogen at different temperatures. The structure of the films was analyzed using X-ray diffraction, atomic force microscope, and scanning electron microscope. Investigation on the […]
bstractSwanepoel method is employed for spectroscopic determination of optical properties of Cu3N thin film using transmittance data. Investigated films have been deposited using reactive magnetron sputtering system. Deposition time was 9 to 21 min. Refractive index, absorption coefficient, and bandgap energy of the samples are determined. Thickness of the films is calculated by Swanepoel method, and […]
