AbstractNanocrystalline α-MoO3 thin films were prepared successfully by thermal annealing of molybdenum (Mo) thin films deposited on quartz and silicon substrates using DC magnetron sputtering method. The influence of annealing temperatures ranging from 400 to 1,000 °C on the structural, morphological and optical properties of the prepared films was investigated by X-ray diffraction, Fourier transform infrared […]
AbstractIn this work, the copper films were deposited on quartz substrates by DC magnetron sputtering method and then, the prepared films were annealed in air atmosphere at different annealing temperatures. Before annealing, some of the copper films, treated by oxygen plasma, for comparison of the results. The structural and morphological properties of the films have […]
