This paper reports the correlation between film thickness, nanostructure and DC electrical properties of copper thin films deposited by PVD method on glass substrate. X-ray diffraction (XRD) and atomic force microscopy (AFM) were used for crystallography and morphology investigation, respectively. Resistivity was measured by four point probe instrument, while a Hall effects measurement system was […]
ZnO thin film of 80 nm thickness was deposited by the sol-gel spin coating method on SiO2/Si substrate and subsequently post-annealed at 500°C with a flow of oxygen for 60 min. Crystallographic structure of the sample was characterized by X-ray diffraction (XRD) method while a field emission scanning electron microscope (FESEM) was used to investigate […]
