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Keyword: Band to Band Tunneling (BTBT)

Original Article
Asymmetric Gate Oxide Thickness Technology for Reduction of Gate Induced Drain Leakage Current in Nanoscale Single Gate SOI MOSFET

Gate Induced Drain Leakage (GIDL) current is one of the main leakage current components in Silicon on Insulator (SOI) MOSFET structure and plays an important role in the data retention time of DRAM cells. GIDL can dominate the drain leakage current at zero bias and will limit the scalability of the structure for low power […]