10.1007/s40089-017-0201-7

The effects of argon ion bombardment on the corrosion resistance of tantalum

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  • A. H. Ramezani*1,
  • A. H. Sari2,
  • A. Shokouhy2,
  1. Department of Physics, West Tehran Branch, Islamic Azad University, Tehran, IR
  2. Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, IR
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Published in Issue 2017-02-17

How to Cite

Ramezani, A. H., Sari, A. H., & Shokouhy, A. (2017). The effects of argon ion bombardment on the corrosion resistance of tantalum. International Nano Letters, 7(1 (March 2017). https://doi.org/10.1007/s40089-017-0201-7
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Abstract

Abstract Application of ion beam has been widely used as a surface modification method to improve surface properties. This paper investigates the effect of argon ion implantation on surface structure as well as resistance against tantalum corrosion. In this experiment, argon ions with energy of 30 keV and in doses of 1 × 10 17 –10 × 10 17  ions/cm 2 were used. The surface bombardment with inert gases mainly produces modified topography and morphology of the surface. Atomic Force Microscopy was also used to patterned the roughness variations prior to and after the implantation phase. Additionally, the corrosion investigation apparatus wear was applied to compare resistance against tantalum corrosion both before and after ion implantation. The results show that argon ion implantation has a substantial impact on increasing resistance against tantalum corrosion. After the corrosion test, scanning electron microscopy (SEM) analyzed the samples’ surface morphologies. In addition, the elemental composition is characterized by energy-dispersive X-ray (EDX) analysis. The purpose of this paper was to obtain the perfect condition for the formation of tantalum corrosion resistance. In order to evaluate the effect of the ion implantation on the corrosion behavior, potentiodynamic tests were performed. The results show that the corrosion resistance of the samples strongly depends on the implantation doses.
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