10.57647/J.JTAP.2023.1704.38

Optical imaging and magnetic field simulation of a DC circular planar magnetron sputtering discharge

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  • Ahmad Reza Rastkar*1,
  • Ali Reza Niknam1,
  • Mostafa Salahshoor2,
  1. Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran
  2. School of Physics, Iran University of Science and Technology, Tehran, Iran
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Received: 2023-02-20

Accepted: 2023-05-09

Published 2023-05-12

How to Cite

1.
Rastkar AR, Niknam AR, Salahshoor M. Optical imaging and magnetic field simulation of a DC circular planar magnetron sputtering discharge. J Theor Appl phys. 2023 May 12;17(4). Available from: https://oiccpress.com/jtap/article/view/1988
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Abstract

In this paper, the optical images of glow discharge plasma and the finite element method simulation of the magnetic field strength in a balanced and two types of unbalanced DC circular planar magnetron sputtering sources are presented. The investigation showed that wherever the magnetic field strength is stronger, the intensity of light and the ionization are greater and consequently, the deposition is higher. The comparison of recorded optical images with the finite element simulation results of the magnetic field strength indicated the correlation between regions of high magnetic field strength and high light emission.

Keywords

  • Finite element method,
  • Glow discharge plasma,
  • Magnetic field distribu tion,
  • Magnetron sputtering
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