TY - EJOUR
PY - 2023
DA - November
TI - Structural and morphological properties of ITO thin films grown by magnetron sputtering
T2 - Journal of Theoretical and Applied Physics
VL - 9
L1 - https://oiccpress.com/journal-of-theoretical-and-applied-physics/article/structural-and-morphological-properties-of-ito-thin-films-grown-by-magnetron-sputtering/
DO - 10.1007/s40094-015-0187-3
N2 - AbstractPhysical properties of transparent and conducting indium tin oxide (ITO) thin films grown by radiofrequency (RF) magnetron sputtering are studied systematically by changing deposition time. The X-ray diffraction (XRD) data indicate polycrystalline thin films with grain orientations predominantly along the (2 2 2) and (4 0 0) directions. From atomic force microscopy (AFM) it is found that by increasing the deposition time, the roughness of the film increases. Scanning electron microscopy (SEM) images show a network of a high-porosity interconnected nanoparticles, which approximately have a pore size ranging between 20 and 30 nm. Optical measurements suggest an average transmission of 80 % for the ITO films. Sheet resistances are investigated using four-point probes, which imply that by increasing the film thickness the resistivities of the films decrease to 2.43 × 10−5 Ω cm.
IS - 4
PB - OICC Press
KW - Indium tin oxide, Magnetron sputtering, Thickness 
EN -