The present report describes the deposition of SiC-NiCr films on Zr substrates under an H2 gas environment by plasma focusing (PF). Using the spark plasma sintering (SPS) method, the anode for the plasma focus device was made from SiC, Ni, and Chromium powders. X-ray diffraction (XRD) of SiC-NiCr samples shows a change in the position and […]
AbstractCadmium sulfide (CdS) thin films are deposited on the fluorine doped tin oxide coated glass substrate using the radio frequency magnetron sputtering setup. The effects of annealing in air on the structural, morphological, and optical properties of CdS thin film are studied. Optimal annealing temperature is investigated by annealing the CdS thin film at different […]
AbstractTo obtain a suitable ohmic contact with the lowest resistivity, chromium (Cr) thin films were deposited on transparent conductive oxide indium tin oxide (ITO) by RF sputtering method in argon atmosphere and its electrical properties were optimized. The deposition of Cr thin film has been performed for the layers with thickness of 150, 300 and […]
