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<!DOCTYPE ArticleSet PUBLIC "-//NLM//DTD PubMed 2.7//EN" "https://dtd.nlm.nih.gov/ncbi/pubmed/in/PubMed.dtd">
<ArticleSet>
<Article>
<Journal>
<PublisherName>OICC Press</PublisherName>
<JournalTitle>International Journal of Nano Dimension</JournalTitle>
<Issn>2228-5059</Issn>
<Volume>5</Volume>
<Issue>4</Issue>
<PubDate PubStatus="epublish">
<Year>2024</Year>
<Month>02</Month>
<Day>29</Day>
</PubDate>
</Journal>
<ArticleTitle>Change of diffused and scattered light with surface roughness of p-type porous Silicon</ArticleTitle>
<VernacularTitle></VernacularTitle>
<FirstPage></FirstPage>
<LastPage></LastPage>
<ELocationID EIdType="doi">10.7508/ijnd.2014.04.014</ELocationID>
<Language>EN</Language>
<AuthorList>
<Author>
<FirstName>F.</FirstName>
<LastName>Alfeel</LastName>
<Affiliation>Department of Physics, Science Faculty, Damascus University, Syria.</Affiliation>
<Identifier Source="ORCID"></Identifier>
</Author>
<Author>
<FirstName>F.</FirstName>
<LastName>Awad</LastName>
<Affiliation>Department of Physics, Science Faculty, Damascus University, Syria.</Affiliation>
<Identifier Source="ORCID"></Identifier>
</Author>
<Author>
<FirstName>I.</FirstName>
<LastName>Alghoraibi</LastName>
<Affiliation>Department of Physics, Science Faculty, Damascus University, Syria.</Affiliation>
<Identifier Source="ORCID"></Identifier>
</Author>
<Author>
<FirstName>F.</FirstName>
<LastName>Qamar</LastName>
<Affiliation>Department of Physics, Science Faculty, Damascus University, Syria.</Affiliation>
<Identifier Source="ORCID"></Identifier>
</Author>
</AuthorList>
<PublicationType>Journal Article</PublicationType>
<History>
<PubDate PubStatus="received">
<Year>2024</Year>
<Month>02</Month>
<Day>29</Day>
</PubDate>
</History>
<Abstract>Porous silicon samples were prepared by electrochemical etching method for different etching times. The structural properties of porous silicon (PS) samples were determined from the Atomic Force Microscopy (AFM) measurements. The surface mean root square roughness (Ï rms) changes as function of porosity were studied, and the influence of etching time on porosity and roughness was studied too. UV-Vis-NIR Spectrophotometer with integrating sphere accessory used to measure the specular reflectance (Rspec) and scattered light (Dsca) for all samples. Changes of scattered light intensity with Ï rms were studied. Theoretical and measured values were compared and they were almost the same.</Abstract>
<ObjectList>
<Object Type="keyword">
<Param Name="value">Atomic force Microscopy (AFM)</Param>
</Object>
<Object Type="keyword">
<Param Name="value">Electrochemical etching time</Param>
</Object>
<Object Type="keyword">
<Param Name="value">Porosity p%</Param>
</Object>
<Object Type="keyword">
<Param Name="value">Porous silicon (PS)</Param>
</Object>
<Object Type="keyword">
<Param Name="value">Scattered light Dsca</Param>
</Object>
<Object Type="keyword">
<Param Name="value">Specular reflectance Rspec</Param>
</Object>
<Object Type="keyword">
<Param Name="value">Surface mean root square roughness (Ïrms)</Param>
</Object>
</ObjectList>
</Article>
</ArticleSet>